青云英语翻译

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翻译结果1翻译结果2 翻译结果3翻译结果4翻译结果5

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溅射沉积是从一个“目标”,即源,沉积薄膜弹出,材料物理气相沉积(PVD)方法,然后到“基材”,如硅片的存款。 Resputtering沉积在沉积过程中离子或原子轰击材料的再次发射。

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溅射沉积是从一个“目标”,即源,沉积薄膜弹出,材料物理气相沉积(PVD)方法,然后到“基材”,如硅片的存款。 Resputtering沉积在沉积过程中离子或原子轰击材料的再次发射。

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溅射沉积是物理气相沉积 (PVD) 方法沉积弹出,从"目标,"材料的薄膜材料的是源,它然后存款到"底",如硅晶片。Resputtering 是 re-emission 沉积物质的原子或离子轰击沉积过程中。

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溅射是物理蒸气喷镀(PVD)的方法,是将交存薄膜,材料由一个“目标”,是源,然后把存款"衬底”,例如一间晶圆。 resputtering是重新排放的材料存放在该书面供词过程离子或原子的轰炸。

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正在翻译,请等待...
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